Stephan Mullender, Carl Zeiss

Title: Multilayer developments for adaptive optics at EUV and beyond
Session: Tuesday 6 October, 11:45

Abstract

Extreme Ultraviolet (EUV) lithography, the leading new patterning technology that simplifies the manufacturing process, is now approaching volume production.
To further fulfill Moore's Law by reducing feature size with future generation EUV tools, adaptive optical components, addressing the aspects of active wavefront correction, as well as the challenges of a wavelength shift towards 7nm, are investigated.

 

 

 

Bio

 to be announced

 

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